Graphene CVD deposition device
Equipped with a rapid cooling mechanism using slide movement of the furnace.
This is a tubular furnace thermal CVD device for synthesizing graphene films. It is equipped with a slide movement mechanism for the furnace, allowing for rapid heating and cooling of samples. An optional motor-driven automatic slide function can also be added. Additionally, by adding a turbo vacuum pump as an option, even higher quality graphene can be deposited.
- Company：マイクロフェーズ
- Price：5 million yen-10 million yen
